Alexandria Digital Research Library

Design Methodologies for Optical Lithography Induced Systematic Variations

Author:
Wuu, Jen-Yi
Degree Grantor:
University of California, Santa Barbara.Electrical & Computer Engineering
Degree Supervisor:
Marek-Sadowska Malgorzata
Place of Publication:
[Santa Barbara, Calif.]
Publisher:
University of California, Santa Barbara
Creation Date:
2011
Issued Date:
2011
Topics:
Computer engineering, Electrical engineering, and Nanotechnology
Keywords:
Design Methodology
Design for Manufacturability
Hotspot Detection
Lithography
Yield
Variability
Description:

Designing robust integrated circuits have become increasingly challenging due to the presence of process variations. One of the main sources of process variations comes from optical lithography, which is the primary technology used for patterning design layouts on wafers. Aggressive scaling of feature size and the postponement of next-generation illumination sources causes serious degradation of on-silicon printed images. As a result, severe pattern distortions may occur, even when various resolution enhancement techniques are applied. In this dissertation, we propose design methodologies to address problems caused by lithography process variability. At the circuit simulation level, we propose a non-rectangular transistor modeling approach that derives an equivalent device gate length and width for accurate post-lithography circuit simulations and analyses. Only one equivalent device is built and it is accurate for both on and off modes. At the layout verification level, we propose a hierarchical lithographic hotspot pattern classification system that is both accurate and computationally efficient. We construct our pattern classifiers using support vector machines and use a layout density-based method for pattern characterization. Experimental results show that our method exhibits excellent predictive capability and complements the pattern matching-based methods very well. Last, at the post-placement layout optimization level, we propose an algorithm that detects lithographic hotspots in a given placement of one-dimensional gridded designs and applies local perturbation of cell locations to remove the hotspots. The hotspot detection system is constructed using machine learning techniques. Experimental results show that our method can effectively remove all hotspots while incurring negligible penalty on estimated wire lengths.

Format:
Text
Collection(s):
UCSB electronic theses and dissertations
ARK:
ark:/13030/m5251jtg
Merritt ARK:
ark:/13030/m5251jtg
Rights:
Inc.icon only.dark In Copyright
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